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J.Health Sci., 52(1), 91-95, 2006
Formation of DNA Damaging Product from Light-Irradiated Nonylphenol
Yoshinori Okamoto,a Tomohiro Hayashi,a Shinpei Matsunami,a Koji Ueda,a Chitose Toda,a Shosuke Kawanishi,b and Nakao Kojima*, a
aFaculty of Pharmacy, Meijo University, 150 Yagotoyama, Tempaku-ku, Nagoya 468-8503, Japan and bDepartment of Environmental and Molecular Medicine, Mie University School of Medicine, 2-174 Edobashi, Tsu, Mie 514-8507, Japan
Nonylphenol (NP) is widely distributed in the environment as a microbial metabolite of nonylphenol polyethoxylates, which are commercially important surfactants. Although there are concerns regarding the estrogenic activity of NP and its effects on wildlife, this paper reports a new detrimental effect for NP; oxidative DNA damage. After UV or sunlight irradiation, several NP photoproducts were detected by high performance liquid chromatography (HPLC). Two HPLC fractions induced formation of 8-oxo-7,8-dihydro-2′-deoxyguanosine (8-oxodG) in calf thymus DNA. Based on gas chromatography/mass spectrometry and UV/visible spectrometry, one fraction was confirmed to contain 4-nonylcatechol. The other active compound remains unidentified. Non-irradiated NP did not exhibit any detectable 8-oxodG formation. These results suggest that NP induces oxidative DNA damage following environmental light exposure. This DNA damaging activity is a new adverse effect of NP and, in addition to estrogenic activity, should be investigated further and taken into consideration during NP risk assessment.
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